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"First principles study of si etching by chf3 plasma source" Weichao Wang, Pil-Ryung Cha, Sang ho Lee, Gyoodong Kim, Moon J. Kim, Kyeongjae Cho, Appl. Surf. Sci., 257, 8767-8771 (2011).
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Prof. WeiChao Wang

Principle Investigator

weichaowang@nankai.edu.cn